Loading...
Identification of the carbon incorporation mechanism during atomic layer deposition of SiCxNy using in situ ATR-FTIR spectroscopy
Ovanesyan, Rafaiel A. Leick, Noemi Kelchner, Kathryn M. Hausmann, Dennis M. Agarwal, Sumit
Ovanesyan, Rafaiel A.
Leick, Noemi
Kelchner, Kathryn M.
Hausmann, Dennis M.
Agarwal, Sumit
Citations
Altmetric:
Advisor
Editor
Date
2017
Date Issued
Date Submitted
Keywords
Research Projects
Organizational Units
Journal Issue
Embargo Expires
Abstract
Associated Publications
Rights
Copyright of the original work is retained by the author.