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dc.contributor.advisorWolden, Colin Andrew
dc.contributor.authorRobbins, Joshua
dc.date.accessioned2023-08-07T18:50:02Z
dc.date.available2023-08-07T18:50:02Z
dc.date.issued2003
dc.identifierT 5775
dc.identifier.urihttp://hdl.handle.net/11124/177656
dc.descriptionIncludes bibliographical references (pages 150-159).
dc.format.mediumdoctoral dissertations
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado School of Mines. Arthur Lakes Library
dc.relation.ispartof2000-2009 - Mines Theses & Dissertations
dc.rightsCopyright of the original work is retained by the author.
dc.subject.lcshPlasma-enhanced chemical vapor deposition
dc.subject.lcshOxides -- Electric properties
dc.subject.lcshThin films -- Electric properties
dc.titleDevelopment and analysis of plasma enhanced chemical vapor deposition of transparent conducting oxides
dc.typeText
thesis.degree.nameDoctor of Philosophy (Ph.D.)
thesis.degree.levelDoctoral
thesis.degree.disciplineChemical Engineering
thesis.degree.grantorColorado School of Mines


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